Researchers have developed a photoresist for two-photon microprinting. It has now been used for the first time to produce three-dimensional polymer microstructures with cavities in the nano range. The scientists report how porosity can be controlled during printing and how this affects light scattering properties of the microstructures.
from Top Technology News -- ScienceDaily https://ift.tt/3kmCHOv
Wednesday, 16 September 2020
Novel photoresist enables 3D printing of smallest porous structures
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